“DOPANT” на російській мові

іменник

легирующая примесь	dopant
добавка	additive addition adjunct dopant makeweight

Conventional ion sources use a tungsten filament to inject the gas containing the dopant with electrons.

Often the conducting properties of a semiconductor can be varied by adding an impurity known as a dopant so that a semiconductor can be made to act like either an insulator or a conductor.

By changing the electrochemical current, the electrolyte composition, and the dopant characteristics of the wafer, one can tune the average diameter of the pores from a few nanometers to several micrometers.

Due to the original content of the iron dopant and the size of the resist pattern, the diameter of the particle can be effectively controlled well below the lithography limit.

Essentially, the losses introduced by the microstructure (surface scattering and so on) should not exceed the reduction in loss we achieve by eliminating dopants and therefore reducing material scattering.

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